F. Agulló-Rueda
F. Agulló-Rueda
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Tribological study of hydrogenated amorphous carbon films with tailored microstructure and composition produced by bias-enhanced plasma chemical vapour deposition
Hydrogen quantification in hydrogenated amorphous carbon films by infrared, Raman and x-ray absorption near edge spectroscopies
DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition
Effect of Bias Voltage on the Physical Properties of Hydrogenated Amorphous Carbon Films Grown by Electron Cyclotron Resonance Chemical Vapour Deposition
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