F. Agulló-Rueda
F. Agulló-Rueda
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CVD
DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition
In the present work, $a$-C:H films have been grown from argon/methane gas mixtures by Electron Cyclotron Resonance Chemical Vapour …
J. G. Buijnsters
,
M. Camero
,
L. Vázquez
,
F. Agulló-Rueda
,
C. Gómez-Aleixandre
,
J. M. Albella
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DOI
Modeling Heterogeneity and Memory Effects on the Kinetic Roughening of Silica Films Grown by Chemical Vapor Deposition
We present discrete and continuum models to describe previous experiments on growth of chemical vapor deposited silica films at 611 K …
F. Ojeda
,
R. Cuerno
,
R. Salvarezza
,
F. Agulló-Rueda
,
L. Vázquez
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DOI
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