F. Agulló-Rueda
F. Agulló-Rueda
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hydrogen
DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition
In the present work, $a$-C:H films have been grown from argon/methane gas mixtures by Electron Cyclotron Resonance Chemical Vapour …
J. G. Buijnsters
,
M. Camero
,
L. Vázquez
,
F. Agulló-Rueda
,
C. Gómez-Aleixandre
,
J. M. Albella
Cite
DOI
Effect of Bias Voltage on the Physical Properties of Hydrogenated Amorphous Carbon Films Grown by Electron Cyclotron Resonance Chemical Vapour Deposition
In the present work, $a$-C:H films have been grown from argon/methane gas mixtures by Electron Cyclotron Resonance Chemical Vapour …
J. G. Buijnsters
,
M. Camero
,
L. Vázquez
,
F. Agulló-Rueda
,
C. Gómez-Aleixandre
,
J. M. Albella
Cite
DOI
Cite
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