F. Agulló-Rueda
F. Agulló-Rueda
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J. M. Albella
Latest
Tribological study of hydrogenated amorphous carbon films with tailored microstructure and composition produced by bias-enhanced plasma chemical vapour deposition
DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition
Effect of Bias Voltage on the Physical Properties of Hydrogenated Amorphous Carbon Films Grown by Electron Cyclotron Resonance Chemical Vapour Deposition
Fundamentos de microelectrónica, nanoelectrónica y fotóníca
Aplicaciones de capas semiconductoras en microelectrónica y fotónica
Transition from Amorphous Boron Carbide to Hexagonal Boron Carbon Nitride Thin Films Induced by Nitrogen Ion Assistance
Hardening mechanisms in graphitic carbon nitride films grown with N$_2$/Ar ion assistance
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